Exprimental proof of concept

Experimental setup. He-Cd laser source was used.
  • λ=441.6nm
  • NA=0.53
Initial design.
  • principal pattern 250 nm half-pitch
  • four subsidiary patterns 350 nm half-pitch
Holographic mask (top view)
Restored aerial image (computer simulation with a virtual mask)
Restored aerial image (experiment with a real mask), captured by CCD via optical magnifier. Light scattering on the elements of the magnifier causes visible phase noise.
Photoresist after exposition, optical microscope inspection x1500
SEM resist inspection