SWHL

Exprimental proof of concept

Experimental setup. He-Cd laser source was used. λ=441.6nm NA=0.53
Initial design. principal pattern 250 nm half-pitch four subsidiary patterns 350 nm half-pitch
Holographic mask (top view)
Restored aerial image (computer simulation with a virtual mask)
Restored aerial image (experiment with a real mask), captured by CCD via optical magnifier. Light scattering on the elements of the magnifier causes visible phase noise.
Photoresist after exposition, optical microscope inspection x1500

SEM resist inspection