Non-flat imaging with single exposure

The holographic mask allows to create a sub-wavelength image on several planes located at distances larger than optical depth of focus (DoF) with a single-mask during a single exposure. [Sub-Wavelength Holographic Lithography (.pdf)]

Other examples:

  • λ=193nm
  • NA=0.7
  • half-pitch: 400nm & 800nm
  • L = 8µm
  • Rayleigh DoF = ±0.34µm
  • λ=355nm
  • NA=0.8
  • half-pitch: 400nm
  • L = 9.6µm
  • Rayleigh DoF = ±0.44µm
  • λ=355nm
  • NA=0.8
  • half-pitch: 200nm & 400nm
  • L = 2.8µm
  • Rayleigh DoF = ±0.44µm